연구진흥

창의적인 신지식 창출과 산업계와의 협력적 네트워크 구축

금주의 우수논문

SCI-E Article; Early Access
Introduction of mask-free patterning of metal lines using aerodynamically focused nanoparticle system
이선영
  1. 성명
    이선영
  2. 소속
    공학대학 재료화학공학과
  3. 캠퍼스
  4. 우수선정주
    2022년 05월 2째주
Author
Im, Taehyeob (Dept Mat & Chem Engn); Son, Minhee (Dept Mat & Chem Engn); 이선영 (Dept Mat & Chem Engn);
Corresponding Author Info
Lee, CS(해당 저자), Hanyang Univ, Dept Mat & Chem Engn, Seoul, South Korea.
E-mail
이메일sunyonglee@hanyang.ac.kr
Document Type
Article; Early Access
Source
MRS BULLETIN Volume: Issue: Pages:- Published:
Times Cited
0
External Information
http://dx.doi.org/10.1557/s43577-022-00314-5
Abstract
We introduce an aerodynamically focused nanoparticle (AFN) system that precisely controls the flow of nanoparticles (NPs) to fabricate line patterns by aerodynamically controlling NP flow upon varying the discharge pressure without using any solvent or binders, which accompanies post processes. We optimized the air compressor pressure and performed a two-step excitation process to ensure high-quality deposition so that the AFN system usefully fabricates line patterns much narrower than its nozzle diameter. The narrower line patterns showed lower resistivities than those for wider patterns. It was observed that when NPs were concentrated at a point, their line widths decreased, while the NP deposition was dense. XRD and TEM analysis revealed that the NPs were highly focused and accelerated as crystal defects were developed. The NPs were densely deposited and adhered well to the substrate. Finally, a bending test revealed that the printed 35-pm-wide lines had the smallest resistance change during 300 cycles. Therefore, an innovative printing system called the AFN system has proven its potential to replace semiconductor patterning and inkjet printing for the application of flexible electronics.
Web of Science Categories
Materials Science, Multidisciplinary; Physics, Applied
Funding
National Research Foundation of Korea - Korean government (MSIT) [2019R1F1A1060586]; Korea Institute for Advancement of Technology - Korean government (MOTIE) [P0008425]
Language
English
attached file